Photon Management Structures Originated by Interference Lithography
نویسندگان
چکیده
منابع مشابه
Interference Lithography
Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...
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The fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defectfree over a large area. This review discusses the relationship betwee...
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ژورنال
عنوان ژورنال: Energy Procedia
سال: 2011
ISSN: 1876-6102
DOI: 10.1016/j.egypro.2011.06.206